Engineering Board Exam Reviewer · Engineering Materials · medium

Doping silicon with boron produces a/an:

1. n-type semiconductor
2. Intrinsic semiconductor
3. p-type semiconductor
4. Insulator

Answer

C. p-type semiconductor

Solution

Boron (Group 13) creates holes as majority carriers.

More Engineering Materials questions

1. The electrical conductivity of a pure (intrinsic) semiconductor:
2. The band gap of silicon at room temperature is approximately:
3. Materials in which the valence band and conduction band overlap, allowing easy electron flow, are:
4. Which of the following metals is most noble (least likely to corrode) in the galvanic series in seawater?
5. Anodizing is a process used mainly to protect:
6. Cracking caused by the combined action of tensile stress and a corrosive environment is called:
7. Corrosion that occurs in narrow gaps such as under gaskets or bolt heads is called:
8. Localized corrosion that forms small holes or cavities on a metal surface is called:
9. In a steel–copper galvanic couple in seawater, which metal corrodes preferentially?
10. When two dissimilar metals are in electrical contact in an electrolyte, the corrosion of the more active metal accelerates. This is called:

All Engineering Materials Reviewer questions